_____Substrate____

_________Applications_________

________PPALS benefits_______


WEB


  • Pretreatment to polymer webs prior to sputtering or evaporation to promote adhesion

  • Compact size

  • Minimal gas load

  • Operates at <0.1Pa

  • High speed treatment


GLASS


  • DLC Deposition

  • Surface cleaning and pretreatment to improve adhesion

  • Compatible with sputtering processes

  • DLC deposition requires periodic cleaning cycles


METAL STRIP


  • Metal Oxide removal

  • Surface cleaning

  • Highest etch rate in the industry

  • Effective removal of oils and contaminants


ion source Applications

Classic linear ion source (LIS)




TM

pointed pole anode layer source (PPALS   )




‚ÄčLinear Anode Layer Ion Sources

Patented technology and process know-how have made General Plasma the world leader in Linear Ion Sources

ion source Products

  • Uniform, Linear Ion Beam
  • Focused, High Energy Ion 
  • Superior Etch Rate
  • Extendible to >3M Substrate Width

Advantages

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