TM
Actual fully utilized ITO target using Moving Magnet Planar Magnetron (>60% target utilization)
Latest patent pending advancement in rotary magnetron sputtering
Contact GPIT for Sputtering Products
Standard End Block
magnetron sputtering products
Reduced maintenance with Ferro-fluid vacuum seal
High water flow with durable mechanical seal
Both standard and compact models available
Ultra-high strength magnet bar for ITO
General Plasma's patent pending Magnet Bar
3-D Magnetic Profile of Magnet Bar Turn-Around
Compact End Block
Magnetron Sputtering Solutions
Moving Magnet Planar Magnetron (with ITO Target)