rotary magnetron end blocks



rotary magnetron magnet bars 

Magnetron Sputtering Solutions

Latest patent pending advancement in rotary magnetron sputtering

Ultra-high strength magnet bar for ITO 

magnetron sputtering products

  • Strong Magnetic Confinement (>1000G @ 10mm Target)
  • Low Axial Sputtering Angle (+/-12 Degree)
  • >80% Target Utilization (No Dog-bone Target)
  • ​1.6E-4 Ohm.cm Bulk Resistivity

3-D Magnetic Profile of Magnet Bar Turn-Around 

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Compact End Block

Standard End Block

TM

General Plasma's patent pending Magnet Bar

Moving Magnet Planar Magnetron (with ITO Target)

Actual fully utilized ITO target using Moving Magnet Planar Magnetron (>60% target utilization)

moving magnet planar magnetron (MMPM   )