TM
Actual fully utilized ITO target using Moving Magnet Planar Magnetron (>60% target utilization)
moving magnet planar magnetron (MMPM )
Latest patent pending advancement in rotary magnetron sputtering
- Alternative to rotary magnetron for expensive target material
- >60% target utilization due to patent pending magnet pack motion profile
- ITO option has >1000G at surface of 6mm target
- Moving Magnet Planar Magnetron Brochure.pdf
- White Paper - Advanced TCO Sputtering for Display Technology - 4_20_13.pdf
Contact GPIT for Sputtering Products
Standard End Block
magnetron sputtering products
Reduced maintenance with Ferro-fluid vacuum seal
High water flow with durable mechanical seal
Both standard and compact models available
- Rotary Magnetron Brochure.pdf
- Compact End Block Specification Sheet.pdf
Ultra-high strength magnet bar for ITO
- Strong Magnetic Confinement (>1000G @ 10mm Target)
- Low Axial Sputtering Angle (+/-12 Degree)
- >80% Target Utilization (No Dog-bone Target)
- 1.6E-4 Ohm.cm Bulk Resistivity
rotary magnetron magnet bars
General Plasma's patent pending Magnet Bar
3-D Magnetic Profile of Magnet Bar Turn-Around
rotary magnetron end blocks
Compact End Block
Magnetron Sputtering Solutions
Moving Magnet Planar Magnetron (with ITO Target)
- Patent pending turn-around magnetic design enables both high target utilization and uniform deposition
- ITO option has >1000G at surface of 10mm thick target
- General Plasma's magnet bar include conversion kit retrofitable to competitors' end blocks