Linear anode layer type ion sources for pre-treatment, metal etching and a range of other applications. General Plasma is the recognized leader in linear ion source technology.
Rotary magnetron magnet bars and end blocks and
Moving magnet planar magnetrons. Patented and patent pending innovations that solve real process and production problems.
It is the world's first production-worthy in-line scalable PECVD technology. Offering high deposition rates, unprecedented uniformity and quality along with long term process stability.
UltraDep In-line PECVD