Linear anode layer type ion sources for pre-treatment, metal etching and a range of other applications. General Plasma is the recognized leader in linear ion source technology.


Sputtering ​Solutions

Advanced Vacuum Thin Film Coating Solutions

Ion ​Sources

Rotary magnetron magnet bars and end blocks and

Moving magnet planar magnetrons. Patented and patent pending innovations that solve real process and production problems.


UltraDep   In-line PECVD


  • April 2015: General Plasma will be exhibiting SVC and John Madocks will present a paper entitled "DLC on Glass and Plastic by In-Line PECVD"


It is the world's first production-worthy in-line scalable PECVD technology. Offering high deposition rates, unprecedented uniformity and quality along with long term process stability. 

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