UltraDep In-line PECVD
Linear anode layer type ion sources for pre-treatment, metal etching and a range of other applications. General Plasma is the recognized leader in linear ion source technology.
December 8, 2020
Announcement of General Plasma Innovative Technologies LLC
General Plasma has finalized a license agreement with General Plasma Innovative Technologies (GPIT) to support and sell GPI's sputter magnetron and linear ion sources product lines. GPIT is also licensed to sell components for GPI's custom vacuum systems. Please route requests for these products to GPIT:
Brett Frostenson | President
General Plasma Innovative Technologies LLC
6741 E Nasumpta Dr | Tucson, AZ 85715 | USA
Tel: +1 208-410-8107
General Plasma will continue to develop and sell sources for Plasma PECVD as well as Vactite Quick Coupling products.
President | General Plasma, Inc
It is the world's first production-worthy in-line scalable PECVD technology. Offering high deposition rates, unprecedented uniformity and quality along with long term process stability.
Rotary magnetron magnet bars and end blocks and
Moving magnet planar magnetrons. Patented and patent pending innovations that solve real process and production problems.