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UltraDep   In-line PECVD

TM

Ion ​Sources

Sputtering ​Solutions

Advanced Vacuum Thin Film Coating Solutions


Linear anode layer type ion sources for pre-treatment, metal etching and a range of other applications. General Plasma is the recognized leader in linear ion source technology.

PRODUCTS

December 8, 2020
Announcement of General Plasma Innovative Technologies LLC

General Plasma has finalized a license agreement with General Plasma Innovative Technologies (GPIT) to support and sell GPI's sputter magnetron and linear ion sources product lines.  GPIT is also licensed to sell components for GPI's custom vacuum systems. Please route requests for these products to GPIT:

  

   Brett Frostenson | President
   General Plasma Innovative Technologies LLC
   6741 E Nasumpta Dr | Tucson, AZ 85715 | USA
   Tel: +1 208-410-8107
   email: brett.frostenson@gpitusa.com


General Plasma will continue to develop and sell sources for Plasma PECVD as well as Vactite Quick Coupling products.


Phong Ngo

President | General Plasma, Inc

 


It is the world's first production-worthy in-line scalable PECVD technology. Offering high deposition rates, unprecedented uniformity and quality along with long term process stability. 

Product Drop Down

Rotary magnetron magnet bars and end blocks and

Moving magnet planar magnetrons. Patented and patent pending innovations that solve real process and production problems.