December 8, 2020
Announcement of General Plasma Innovative Technologies LLC
General Plasma has finalized a license agreement with General Plasma Innovative Technologies (GPIT) to support and sell GPI's sputter magnetron and linear ion sources product lines. GPIT is also licensed to sell components for GPI's custom vacuum systems. Please route requests for these products to GPIT:
Brett Frostenson | President
General Plasma Innovative Technologies LLC
213 E. Spruce Avenue, PO Box 701, Fairfield, ID 83327 USA
Tel: +1 208-410-8107
email: brett.frostenson@gpitusa.com
General Plasma will continue to develop and sell sources for Plasma PECVD as well as Vactite Quick Coupling products.
Phong Ngo
President | General Plasma, Inc
PRODUCTS
It is the world's first production-worthy in-line scalable PECVD technology. Offering high deposition rates, unprecedented uniformity and quality along with long term process stability.
Sputtering Solutions
Linear anode layer type ion sources for pre-treatment, metal etching and a range of other applications. General Plasma is the recognized leader in linear ion source technology.
Ion Sources
Rotary magnetron magnet bars and end blocks and
Moving magnet planar magnetrons. Patented and patent pending innovations that solve real process and production problems.
UltraDep In-line PECVD