December 8, 2020
Announcement of General Plasma Innovative Technologies LLC

General Plasma has finalized a license agreement with General Plasma Innovative Technologies (GPIT) to support and sell GPI's sputter magnetron and linear ion sources product lines.  GPIT is also licensed to sell components for GPI's custom vacuum systems. Please route requests for these products to GPIT:


   Brett Frostenson | President
   General Plasma Innovative Technologies LLC
   213 E. Spruce Avenue, PO Box 701, Fairfield, ID  83327  USA

   Tel: +1 208-410-8107

General Plasma will continue to develop and sell sources for Plasma PECVD as well as Vactite Quick Coupling products.

Phong Ngo

President | General Plasma, Inc



It is the world's first production-worthy in-line scalable PECVD technology. Offering high deposition rates, unprecedented uniformity and quality along with long term process stability. 

Sputtering ​Solutions

Linear anode layer type ion sources for pre-treatment, metal etching and a range of other applications. General Plasma is the recognized leader in linear ion source technology.

Ion ​Sources

Rotary magnetron magnet bars and end blocks and

Moving magnet planar magnetrons. Patented and patent pending innovations that solve real process and production problems.

UltraDep   In-line PECVD

Advanced Vacuum Thin Film Coating Solutions


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